发明名称 |
EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS |
摘要 |
An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.
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申请公布号 |
US2012119116(A1) |
申请公布日期 |
2012.05.17 |
申请号 |
US201113293914 |
申请日期 |
2011.11.10 |
申请人 |
KAKIZAKI KOUJI;NAGAI SHINJI;YANAGIDA TATSUYA;GIGAPHOTON INC. |
发明人 |
KAKIZAKI KOUJI;NAGAI SHINJI;YANAGIDA TATSUYA |
分类号 |
G21K5/00 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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