发明名称 ELECTRON BEAM EXPOSURE DEVICE, ELECTRON BEAM EXPOSURE METHOD, ORIGINAL PLATE AND METHOD FOR PRODUCING THE SAME, AND WORKING MOLD AND METHOD FOR PRODUCING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To suppress occurrence of error attributable to the resolution of a detector. <P>SOLUTION: A device includes: resolution input means for inputting a resolution of a detector separately used for detecting information of a data region and a servo signal of a servo region on a magnetic recording medium; exposure position candidate determination means for determining a candidate &alpha;, &beta; of exposure positions by setting, on a substrate 4, a distance multiplied by a natural number of the resolution input by the resolution input means, the distance between a candidate &alpha;, &beta; of a certain exposure position and a candidate &alpha;, &beta; of another exposure position; movement means for moving an irradiation position of an electron beam relatively to the substrate 4; and exposure means for optically exposing with a form corresponding to a servo pattern and to a data pattern. Further, the exposure is performed only on a candidate of a certain exposure position determined by the exposure position candidate determination means by using the exposure means while the substrate 4 is moved by the movement means, and/or the exposure is performed continuously from the candidate &alpha;, &beta; of a certain exposure position as starting point and the candidate &alpha;, &beta; of another exposure position as ending point. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012094781(A) 申请公布日期 2012.05.17
申请号 JP20100242800 申请日期 2010.10.28
申请人 HOYA CORP 发明人 YASUMORI JUNICHI;YAMASHITA HIROSHI
分类号 H01L21/027;G11B5/84 主分类号 H01L21/027
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