发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
摘要 <P>PROBLEM TO BE SOLVED: To shorten the time required for reducing hydrophobicity after liquid immersion exposure while the hydrophobicity of a film surface in liquid immersion exposure is increased. <P>SOLUTION: There is provided a radiation-sensitive resin composition containing a polymer [A] comprising a repeating unit (a1) having a group represented by any of the following formulas (1-1) to (1-3) and also comprising a fluorine atom; and a radiation-sensitive acid generator [B]. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012093740(A) 申请公布日期 2012.05.17
申请号 JP20110214134 申请日期 2011.09.29
申请人 JSR CORP 发明人 NAKAHARA KAZUO;SATO MITSUHISA;ASANO YUSUKE
分类号 G03F7/039;C08F220/36;H01L21/027 主分类号 G03F7/039
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