发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND |
摘要 |
<P>PROBLEM TO BE SOLVED: To shorten the time required for reducing hydrophobicity after liquid immersion exposure while the hydrophobicity of a film surface in liquid immersion exposure is increased. <P>SOLUTION: There is provided a radiation-sensitive resin composition containing a polymer [A] comprising a repeating unit (a1) having a group represented by any of the following formulas (1-1) to (1-3) and also comprising a fluorine atom; and a radiation-sensitive acid generator [B]. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012093740(A) |
申请公布日期 |
2012.05.17 |
申请号 |
JP20110214134 |
申请日期 |
2011.09.29 |
申请人 |
JSR CORP |
发明人 |
NAKAHARA KAZUO;SATO MITSUHISA;ASANO YUSUKE |
分类号 |
G03F7/039;C08F220/36;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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