发明名称 VAPOR DEPOSITION MATERIAL FOR DEPOSITING THIN FILM, THIN FILM SHEET PROVIDED WITH THE THIN FILM, AND LAMINATED SHEET
摘要 <P>PROBLEM TO BE SOLVED: To provide: a vapor deposition material which is suitable for the deposition of a thin film having excellent transparency and gas barrier properties; a thin film sheet provided with the thin film; and a laminated sheet. <P>SOLUTION: In the vapor deposition material made by mixing first oxide powder and second oxide powder, the first oxide powder is composed of MgO powder, purity of the first oxide in the first oxide powder is &ge;98%, the second oxide powder is composed of a powdery mixture of CaO and ZnO, and purity of the second oxide in the second oxide powder is &ge;98%. The vapor deposition material is composed of a pellet comprising first oxide particles and second oxide particles, the molar ratio between the first oxide and the second oxide in the vapor deposition material is (5 to 90):(95 to 10), and also, basicity of the pellet is &ge;0.1. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012092429(A) 申请公布日期 2012.05.17
申请号 JP20110182339 申请日期 2011.08.24
申请人 MITSUBISHI MATERIALS CORP 发明人 MAYUZUMI YOSHIAKI;ARIIZUMI KUMIKO;YOSHIDA YUUKI;SAKURAI HIDEAKI
分类号 C23C14/24;B32B9/00;C23C14/08 主分类号 C23C14/24
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