发明名称 SUPPORT PLATE PEELING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a support plate peeling apparatus which removes an adhesive adhered to a semiconductor wafer after peeling the support plate without damaging the semiconductor wafer under dry conditions. <P>SOLUTION: A demounter 10 includes a peel roller 204, a first pressurizing member 208, a second pressurizing member 212, a stepping motor 222, a ball screw 226, first elastic members (238, 240), and second elastic members (234, 236). The first elastic members (238, 240) are formed so that downward force acting from the stepping motor 222 and the ball screw 226 to the second pressurizing member 212 is transmitted to the first pressurizing member 208. The second elastic members (234, 236) are disposed so that a cap bolt 244 gets compressed when suspending the first pressurizing member 208. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012094736(A) 申请公布日期 2012.05.17
申请号 JP20100241746 申请日期 2010.10.28
申请人 TATSUMO KK 发明人 KOBIKI TAKAHIRO
分类号 H01L21/02;H01L21/683 主分类号 H01L21/02
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