发明名称 Lactone photoacid generators and resins and photoresists comprising same
摘要 New lactone-containing photoacid generator compounds ("PAGs") and photoresist compositions that comprise such PAG compounds are provided. These photoresist compositions are useful in the manufacture of electronic devices
申请公布号 EP2452941(A1) 申请公布日期 2012.05.16
申请号 EP20110189110 申请日期 2011.11.15
申请人 ROHM AND HAAS ELECTRONIC MATERIALS LLC 发明人 AQAD, EMAD;LI, MINGQI;XU, CHENG-BAI;LIU, CONG
分类号 C07D493/08;G03F7/00 主分类号 C07D493/08
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