发明名称 |
Photomask blank and photomask |
摘要 |
A photomask blank comprises a transparent substrate (1), a light-shielding film (2) of an optionally transition metal-containing silicon material, and an etching mask film (3) of a chromium compound base material. The etching mask film consists of multiple layers (31,32) of different composition which are deposited by reactive sputtering, the multiple layers including, in combination, a first layer (31) of a material which imparts a compression stress when deposited on the substrate as a single composition layer and a second layer (32) of a material which imparts a tensile stress when deposited on the substrate as a single composition layer. |
申请公布号 |
EP2237107(B1) |
申请公布日期 |
2012.05.16 |
申请号 |
EP20100003481 |
申请日期 |
2010.03.30 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
INAZUKI, YUKIO;KANEKO, HIDEO;YOSHIKAWA, HIROKI |
分类号 |
G03F1/32;G03F1/50;G03F1/54 |
主分类号 |
G03F1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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