COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING RESIST PATTERN USING THE SAME,申请号EP20090712004-传众专利搜索

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发明名称	COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
摘要
申请公布号	EP2251742(B1)	申请公布日期	2012.05.16
申请号	EP20090712004	申请日期	2009.02.19
申请人	NISSAN CHEMICAL INDUSTRIES, LTD.	发明人	SAKAMOTO, RIKIMARU;ENDO, TAKAFUMI
分类号	C08G59/42;G03F7/09;G03F7/11	主分类号	C08G59/42
代理机构		代理人
主权项
地址

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