发明名称 High performance system-on-chip inductor using post passivation process
摘要 A system and method for forming post passivation inductors, and related structures, is described. High quality electrical components, such as inductors and transformers, are formed on a layer of passivation, or on a thick layer of polymer over a passivation layer.
申请公布号 US8178435(B2) 申请公布日期 2012.05.15
申请号 US20030445558 申请日期 2003.05.27
申请人 MEGICA CORPORATION 发明人 LIN MOU-SHIUNG
分类号 H01L21/4763;H01L21/02;H01L21/768;H01L23/522;H01L23/528;H01L23/532;H01L23/60;H01L23/64;H01L27/06;H01L27/08 主分类号 H01L21/4763
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