| 摘要 |
PURPOSE: A pattern formation device and method, and a manufacturing method of a semiconductor device are provided to improve productivity by omitting a process for inserting imprint material to a pattern of a template without a gap. CONSTITUTION: A maintenance unit(4) maintains a template and a processed body which is a pattern formation object in the state that it each other faces. The maintenance unit comprises a processed body maintenance unit(5) maintaining the processed body, and a template maintenance unit(6) maintaining the template. A transport tool(2) separates the processed body maintenance unit and the template maintenance unit. A power source(3) supplies voltage to a contactor(7) contacting to a conductive film. A controller(1) controls operation of the power source and the transport tool.
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