发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER USING THE SAME
摘要 PURPOSE: A photo-sensitive resin composition and a color filter using the same are provided to improve aperture ratio and contrast ratio and to efficiently apply the color filter to a thin film transistor array substrate. CONSTITUTION: A photo-sensitive resin composition includes acryl-based binder resins with structural units, photopolymerizable monomers, photopolymerizable initiators, pigments, and solvents. One structural unit is represented by chemical formula 1. Another structural unit is represented by chemical formula 2. In chemical formula 1, R1 is a hydrogen element or a C1 to C10 alkyl group; R2, R3, and R4 are identical or different and are hydrogen elements or substituted or non-substituted (meta)acrylate groups; at least one of R2, R3, and R4 is substituted or non-substituted (meta)acrylate groups; Z1, Z2, and Z3 are substituted or non-substituted C1 to C20 alkylene groups. In chemical formula 2, R20 is a hydrogen element or a C1 to C10 alkyl group; R21 is a carboxylic group, a substituted or non-substituted C1 to C20 alkyl group, or COR"COOH; and R' is a substituted or non-substituted C1 to C20 alkylene group or a substituted or non-substituted C1 to C20 alkoxylene group.
申请公布号 KR20120047344(A) 申请公布日期 2012.05.14
申请号 KR20100103490 申请日期 2010.10.22
申请人 CHEIL INDUSTRIES INC. 发明人 LEE, CHANG MIN;KIM, JUN SEOK;LEE, KIL SUNG
分类号 G03F7/027;G02B5/20;G03F7/028 主分类号 G03F7/027
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