| 摘要 |
PURPOSE: A film deposition device and method are provided to reduce differences in the thickness of a thin film formed on an object through a correcting process and reduce the purity degradation of a thin film. CONSTITUTION: A film deposition device comprises a film deposition source(21), a moving unit, a crystal oscillator for measurement(22), and a crystal oscillator for correction(23). The film deposition source heats a film deposition material and emits the vaporized film deposition material. The moving unit moves the film deposition source between a set film deposition standby position and a set film deposition position while holding the crystal oscillators. The crystal oscillator for measurement monitors the amount of the vaporized film deposition material emitted from the film deposition source. The crystal oscillator for correction corrects the measurement of the crystal oscillator for measurement. |
