发明名称 MANUFACTURING METHOD OF NITRIDE COMPOUND SEMICONDUCTOR ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a nitride compound semiconductor chip capable of accurately cutting a wafer in good yield. <P>SOLUTION: A manufacturing method of a nitride compound semiconductor chip for separating a wafer on which a nitride compound semiconductor is laminated on a GaN substrate into chips comprises: a step of polishing the GaN substrate so that the thickness becomes greater than or equal to 100 &mu;m and less than or equal to 210 &mu;m and a step of cutting the wafer from the side on which the nitride compound semiconductor is laminated with a cutter with the condition that the angle of a central axis of the cutter for the wafer is greater than 60&deg; and less than 75&deg; and the push-in depth of the cutter is 15% or below of the thickness of the GaN substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012089558(A) 申请公布日期 2012.05.10
申请号 JP20100232471 申请日期 2010.10.15
申请人 NICHIA CHEM IND LTD 发明人 MATSUMOTO KOICHI;YOSHIDA YASUSHI;ITO TAKESHI
分类号 H01L21/301;H01L33/32 主分类号 H01L21/301
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