| 发明名称 |
POLYBENZOXAZOLE PRECURSOR, PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
| 摘要 |
A polybenzoxazole precursor is represented by the following formula (1): wherein R1a to R4a, R1b to R4b, X1, Y1 and m are defined in the specification. |
| 申请公布号 |
US2012115333(A1) |
申请公布日期 |
2012.05.10 |
| 申请号 |
US201213352589 |
申请日期 |
2012.01.18 |
| 申请人 |
SATO KENICHIRO;YAMANAKA TSUKASA;FUJIFILM CORPORATION |
发明人 |
SATO KENICHIRO;YAMANAKA TSUKASA |
| 分类号 |
H01L21/312;C07D403/12;C08G73/14 |
主分类号 |
H01L21/312 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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