发明名称 |
COATING FILM FORMATION METHOD AND COATING FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a high quality coating film which is thin and nonetheless has excellent appearance and functional performance, and to provide the high quality coating film. <P>SOLUTION: A high quality coating film formation method comprises the steps of: forming the coating film by spraying a mixture having a coating film formation ability prepared by dissolving a precursor of a high molecular compound or the high molecular compound in a subcritical or super-critical fluid and applying the mixture onto the surface of an object; and forming the high quality coating film having ≤20 μm thickness and ≤0.8 μm surface roughness Rz obtained by removing the waving by 8 mm cutoff value with respect to a surface shape curve measured by a contact type surface roughness meter. In such a case, the coating condition is controlled so that the viscosity right after formation of the coating film becomes 10-300 mPa sec. A coating film product is also provided. The high quality coating film product having excellent smoothness in which the coating film having ≤0.8 μm surface roughness Rz is formed is provided by high pressure carbon dioxide coating. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012086175(A) |
申请公布日期 |
2012.05.10 |
申请号 |
JP20100235881 |
申请日期 |
2010.10.20 |
申请人 |
MIYAGI PREFECTURE;KAMI DENSHI KOGYO KK;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE& TECHNOLOGY |
发明人 |
SATO ISAYUKI;CHIYOKUBO TAKESHI;HIGUCHI ATSUSHI;MIYAMOTO TATSUYA;NAKATSUKA ASAO;HAYASAKA NOBUAKI;YUKISHIMO KATSUZO;SUZUKI AKIRA;KAWASAKI SHINICHIRO;AIZAWA TAKASHI |
分类号 |
B05D1/02;B01J3/00;C08J7/04;C09D7/00;C09D201/00 |
主分类号 |
B05D1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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