发明名称 |
LOW LINT KNITTING USING NYLON/POLYESTER PARTITION YARN, PROCESS FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A method for fabricating a knitted fabric of low lint using nylon/polyester partition yarn is provided to minimize lint and to prevent scratch in case of wiping a wafer and optical lens. CONSTITUTION: A knitted fabric using nylon/polyester partition yarn is fabricated by spraying air to draw texture yarn(DTY) to remove lint and dust in case of knitting with DTY, partitioning with 1-10% of sodium hydroxide(NaOH) solution at 80-110°C for 25-50 minutes, and shrinking the knitted fabric. The fineness of the DTY is 40-90 denier. |
申请公布号 |
KR20120045563(A) |
申请公布日期 |
2012.05.09 |
申请号 |
KR20100107172 |
申请日期 |
2010.10.29 |
申请人 |
KOREA HIGH TECH TEXTILE RESEARCH INSTITUTE;GEOYOUNG TEXTILE CO., LTD. |
发明人 |
YONG, KWNAG JOONG;KIM, SUN BONG |
分类号 |
D04B1/16;D04B35/32 |
主分类号 |
D04B1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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