| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide, for example, an etching waste liquid regenerating apparatus which can remove a Mo component and an Al component contained in a phosphoric acid-containing etching waste liquid to regenerate an etching waste liquid in a more cost effective and more efficient manner. <P>SOLUTION: An etching waste liquid regenerating apparatus 1 comprises a waste liquid storage tank 4 for storing an etching waste liquid, a diluting part 5 for diluting the etching waste liquid within the waste liquid storage tank 4 to a pH value of 0 to 1.0, adsorption columns 14, 15 packed with an aminophosphoric acid-type chelate resin in which the phosphoric acid group is of an H type, a waste liquid supply part 8 for supplying the etching waste liquid within the waste liquid storage tank 4 into the adsorption columns 14, 15, and a concentrating part 20 for removing water from the diluted etching waste liquid, which flows out of the adsorption columns 14, 15, for its concentration. <P>COPYRIGHT: (C)2009,JPO&INPIT |
