METHOD FOR MANUFACTURING DIELECTRIC DEVICE

摘要

[Problem] To provide a method for manufacturing a dielectric device that can increase the etching selectivity between a ferroelectric substance and an electrode and perform high precision etching of a ferroelectric substance. [Solution] A dielectric layer (3) formed from an oxide is formed on a first electrode layer (2), which is formed from a metal. An etching mask (5) is formed on the dielectric layer (3). The first electrode layer is exposed by etching of the dielectric layer (3) being carried out via the etching mask (5) using etching plasma with a carbon fluoride gas as the main component.