发明名称 MICROMACHINED STRUCTURES
摘要 A micromachined structure includes a substrate and a suspended structure. The substrate has a cavity formed thereon. The suspended structure is formed on the cavity of the substrate. The suspended structure includes a first metal layer, a second metal layer, and a first dielectric layer positioned between the first and second metal layers, wherein the first dielectric layer has a first opening in communication with the cavity through an opening formed in the first metal layer.
申请公布号 US2012107545(A1) 申请公布日期 2012.05.03
申请号 US201213343187 申请日期 2012.01.04
申请人 WANG CHUANWEI;TSAI MING HAN;SUN CHIH MING;FANG WEILEUN;PIXART IMAGING INC. 发明人 WANG CHUANWEI;TSAI MING HAN;SUN CHIH MING;FANG WEILEUN
分类号 B32B3/08;B32B3/10 主分类号 B32B3/08
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