发明名称 |
TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (1) |
摘要 |
The present invention relates to a texture-etchant composition for a crystalline silicon wafer to form a micro-pyramidal structure that can maximize the light absorption on the surface of the crystalline silicon, and a method for etching the crystalline silicon wafer using same, in a crystalline silicon wafer texture-etching composition comprising (A) an alkali compound, (B) a cyclic compound having a boiling point of 100? or above,(C) a compound having silica, and (D) water, and a method for etching a crystalline silicon wafer using same. |
申请公布号 |
WO2012021026(A3) |
申请公布日期 |
2012.05.03 |
申请号 |
WO2011KR05949 |
申请日期 |
2011.08.12 |
申请人 |
DONGWOO FINE-CHEM CO., LTD.;HONG, HYUNG-PYO;LEE, JAE-YOUN;LIM, DAE-SUNG |
发明人 |
HONG, HYUNG-PYO;LEE, JAE-YOUN;LIM, DAE-SUNG |
分类号 |
C23F1/32;C23F1/40;H01L21/306 |
主分类号 |
C23F1/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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