发明名称 METHOD AND APPARATUS FOR WASHING MOLD FOR IMPRINTING APPLICATIONS, AND PROCESS FOR PRODUCING MOLD FOR IMPRINTING APPLICATIONS
摘要 <p>A washing method for removing a mold release layer that is bound to a base through a siloxane bond from a mold for imprinting applications that comprises the base and the mold release layer, which comprises a first washing step and a second washing step, wherein the first washing step involves reducing the water contact angle of the surface of the mold release layer and the second washing step involves bringing the mold release layer that has undergone the first washing step into contact with an alkaline washing solution.</p>
申请公布号 WO2012056911(A1) 申请公布日期 2012.05.03
申请号 WO2011JP73750 申请日期 2011.10.07
申请人 DAI NIPPON PRINTING CO., LTD.;YAMADA, NORIKO;AMANO, AKIKO 发明人 YAMADA, NORIKO;AMANO, AKIKO
分类号 B29C33/72;B29C59/02;H01L21/027 主分类号 B29C33/72
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