发明名称 SUBSTRATE ECHING APPARATUS
摘要 PURPOSE: A substrate etching device is provided to prevent flow of water drops formed on a substrate by forming water on the substrate in a mist type using principles of a humidifier. CONSTITUTION: A touch panel is comprised of a transparent electrode(1) and a contact part(2). The contact part is a dot spacer. A transparent electrode is mounted on the surface of a glass substrate(4). A concavo-convex(3) shape is formed on a surface facing the transparent electrode. The concavo-convex shape is formed by facing a concave part and a convex part to each other.
申请公布号 KR20120042361(A) 申请公布日期 2012.05.03
申请号 KR20100104031 申请日期 2010.10.25
申请人 FNS TECH CO., LTD. 发明人 HWANG, KYU SANG;KIM, PAL KON
分类号 H01L21/3063 主分类号 H01L21/3063
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