发明名称 Passivation layer for a circuit device and method of manufacture
摘要 <p>According to one embodiment of the disclosure, a method for passivating a circuit device generally includes providing a substrate having a substrate surface, forming an electrical component on the substrate surface, and coating the substrate surface and the electrical component with a first protective dielectric layer. The first protective dielectric layer is made of a generally moisture insoluble material having a moisture permeability less than 0.01 gram/meter<Sup>2</Sup>/day, a moisture absorption less than 0.04 percent, a dielectric constant less than 10, a dielectric loss less than 0.005, a breakdown voltage strength greater than 8 million volts/centimeter, a sheet resistivity greater than 1015 ohm- centimeter, and a defect density less than 0.5/centimeter<Sup>2</Sup>.</p><p>To be accompanied, when published, by Figure 1 of the accompanying drawings. </p>
申请公布号 EP2385546(A3) 申请公布日期 2012.05.02
申请号 EP20110176150 申请日期 2008.01.24
申请人 RAYTHEON COMPANY 发明人 BEDINGER, JOHN M;MOORE, MICHAEL A;HALLOCK, ROBERT B;TABATABAIE-ALAVI, KAMAL;KAZIOR, THOMAS E
分类号 H01L21/768;H01L23/31;H01L23/482 主分类号 H01L21/768
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