PHOTOLITHOGRAPHY APPARATUS

摘要

PURPOSE: An exposure apparatus is provided to minimize optical energy loss by irradiating a mask with light emitted from an UV LED through an optical fiber and to eliminate the light from unnecessary ultraviolet rays without adding a lighting system. CONSTITUTION: A mask has a predetermined circuit pattern which is printed on a semiconductor. An UV LED module(230) emits ultraviolet light. The UV LED module comprises a plurality of LEDs, a mounting case, and a mounting part. The plurality of LEDs is arranged in the mounting part and the mounting part is formed in the mounting case. A light guider(250) is optically combined with the UV LED module. A diffuse sheet(270) diffuses the ultraviolet light passing through the light guider to the mask. Housing(210) forms a predetermined receiving space for receiving the UV LED module, the light guider, and the diffuse sheet.