| 发明名称 |
PHOTOLITHOGRAPHY APPARATUS |
| 摘要 |
<p>PURPOSE: An exposure apparatus is provided to uniformly irradiate a mask with light emitted from an UV LED by including a light guide plate to eliminate light of an unnecessary ultraviolet range without adding a lighting system. CONSTITUTION: A mask has a predetermined circuit pattern which is printed on a semiconductor wafer. A light guide plate(235) radiates light emitted from UV LEDs(233a, 233b) towards a mask. A reflective sheet(237) reflects the light having an ultraviolet range emitted from the UV LED. A diffuse sheet(250) is arranged between the light guide plate and the mask and diffuses the light having the ultraviolet range radiated from the light guide plate to the mask. The diffuse sheet is accommodated in a housing(210) in order to cover a UV LED module(230). The housing has a predetermined receiving space for accommodating the UV LED module and the diffuse sheet.</p> |
| 申请公布号 |
KR20120041479(A) |
申请公布日期 |
2012.05.02 |
| 申请号 |
KR20100102954 |
申请日期 |
2010.10.21 |
| 申请人 |
LG INNOTEK CO., LTD. |
发明人 |
MAENG, JI HYOUNG;HONG, SANG JUN;LIM, DONG NYUNG;BYUN, YOUNG SUCK;JEONG, DAE SOO |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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