发明名称 Positive photosensitive resin composition
摘要 It is an object of the present invention to provide a positive photosensitive resin composition capable of easily forming an image having high water repellency and high oil repellency on a surface of a cured film thereof even after a treatment with oxygen plasma or the like, and also having an insulating property with high precision and high throughput; and a cured film suitable for a film material of various displays obtained using the positive photosensitive resin composition.
申请公布号 US8168371(B2) 申请公布日期 2012.05.01
申请号 US20080449022 申请日期 2008.01.18
申请人 HATANAKA TADASHI;NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 HATANAKA TADASHI
分类号 G03F7/039;G03F7/004 主分类号 G03F7/039
代理机构 代理人
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