发明名称 III-nitride semiconductor device fabrication
摘要 A method of fabricating a III-nitride power semiconductor device which includes selective prevention of the growth of III-nitride semiconductor bodies to selected areas on a substrate in order to reduce stresses and prevent cracking.
申请公布号 US8168000(B2) 申请公布日期 2012.05.01
申请号 US20060452547 申请日期 2006.06.14
申请人 BRIERE MIKE;BEACH ROBERT;INTERNATIONAL RECTIFIER CORPORATION 发明人 BRIERE MIKE;BEACH ROBERT
分类号 C30B25/04 主分类号 C30B25/04
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