| 摘要 |
<p>PURPOSE: A photoresist composition, a flat panel display device using the same, a semiconductor device are provided to improve residual film rate and to prevent the reduction of sensitivity although h-line light source is used. CONSTITUTION: A photoresist composition includes 10-25 weight% of alkali soluble resin, 0.1-5 weight% of oxime urethane-based photobase generator, 1-10 weight% of photosensitive compound, and remaining amount of solvent. The oxime urethane-based photobase generator is selected from compounds displayed chemical formulas 1 to 4. The photosensitive compound is quinonediazide compound. The solvent is one or more selected from a group including glycol ether ester, glycol ether, ester, ketone, and cyclic ester.</p> |
