ANTI-STATIC SILICONE RELEASE COATING FILM

摘要

PURPOSE: An antistatic silicon release film is provided to reduce contamination phenomenon of product due to antistatic phenomenon at delamination from adhesive because of excellent antistatic performance, and to have excellent adhesion to a coating layer and a substrate, because of a release layer hardly interrupting release layer curing, thereby having stable releasing characteristics, and excellent adhesion of a coating layer and a substrate. CONSTITUTION: An antistatic silicon release film comprises a polyester substrate film, and a coating layer spread by a release composition including a silicone acryl copolymer resin on at least one side of the polyester thin film one or more times, and satisfies equation 1: : X <=10^10 and equation 2: Y >=80 at the same time. In equations, X is the surface resistance(Ω/sq) of the coating layer, and Y is contents abrasion ratio(%) of the coating layer. The antistatic release composition comprises a conductive polymer, and the antistatic release composition is diluted by solvent to form solid 1-5 weight% of solid phase on the basis of the weight of whole composition.