发明名称 |
PLASMA STERILIZATION APPARTUS, PLASMA STERILIZATION SYSTEM AND PLASMA STERILIZATION METHOD |
摘要 |
<p>The purpose is to provide an apparatus that, when performing sterilization using plasma, performs sterilization very efficiently by measuring a specific light emission spectrum and assessing microbe activity/inactivity in real time. The solution is to apply plasma to an object to be treated from a plasma source connected to an AC power supply and detect light emission from the object being treated that arises from the plasma application with an emission intensity-detecting unit. By detecting the wavelength intensity of hydrogen or hydroxyl groups in particular, microbe activity/inactivity can be assessed at an early stage. Consequently, output of the power supply can be controlled as appropriate for the sterilization.</p> |
申请公布号 |
WO2012053083(A1) |
申请公布日期 |
2012.04.26 |
申请号 |
WO2010JP68550 |
申请日期 |
2010.10.21 |
申请人 |
HITACHI, LTD.;TANDOU, TAKUMI;NEGISHI, NOBUYUKI;ITABASHI, NAOSHI |
发明人 |
TANDOU, TAKUMI;NEGISHI, NOBUYUKI;ITABASHI, NAOSHI |
分类号 |
A61L2/14;A61L9/22;G01N21/68;H05H1/24 |
主分类号 |
A61L2/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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