发明名称 PLASMA STERILIZATION APPARTUS, PLASMA STERILIZATION SYSTEM AND PLASMA STERILIZATION METHOD
摘要 <p>The purpose is to provide an apparatus that, when performing sterilization using plasma, performs sterilization very efficiently by measuring a specific light emission spectrum and assessing microbe activity/inactivity in real time. The solution is to apply plasma to an object to be treated from a plasma source connected to an AC power supply and detect light emission from the object being treated that arises from the plasma application with an emission intensity-detecting unit. By detecting the wavelength intensity of hydrogen or hydroxyl groups in particular, microbe activity/inactivity can be assessed at an early stage. Consequently, output of the power supply can be controlled as appropriate for the sterilization.</p>
申请公布号 WO2012053083(A1) 申请公布日期 2012.04.26
申请号 WO2010JP68550 申请日期 2010.10.21
申请人 HITACHI, LTD.;TANDOU, TAKUMI;NEGISHI, NOBUYUKI;ITABASHI, NAOSHI 发明人 TANDOU, TAKUMI;NEGISHI, NOBUYUKI;ITABASHI, NAOSHI
分类号 A61L2/14;A61L9/22;G01N21/68;H05H1/24 主分类号 A61L2/14
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