A merged PN/Schottky diode is provided having a substrate of a first conductivity type and a grid of doped wells of the second conductivity type embedded in the substrate. A Schottky barrier metal layer makes a Schottky barrier contact with the surface of the substrate above the grid. Selected embedded wells in the grid may contact the Schottky barrier metal layer, while most embedded wells do not. The diode forward voltage drop is reduced for the same diode area with reverse blocking benefits similar to a conventional JBS structure.
申请公布号
WO2012054032(A1)
申请公布日期
2012.04.26
申请号
WO2010US53423
申请日期
2010.10.20
申请人
MICROSEMI CORPORATION;ZHAO, FENG;ODEKIRL, BRUCE;SDRULLA, DUMITRU