| 发明名称 |
Stencils for High-Throughput Micron-Scale Etching of Substrates and Processes of Making and Using the Same |
| 摘要 |
The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.
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| 申请公布号 |
US2012097329(A1) |
申请公布日期 |
2012.04.26 |
| 申请号 |
US201113112166 |
申请日期 |
2011.05.20 |
| 申请人 |
STERN ERIC;BLANCHET GRACIELA BEATRIZ;HUNTING LINDSAY;MAYERS BRIAN T.;MCLELLAN JOSEPH M.;REUST PATRICK;KUEGLER RALF;GILLIES JENNIFER;MERCK PATENT GESELLSCHAFT;NANO TERRA INC. |
发明人 |
STERN ERIC;BLANCHET GRACIELA BEATRIZ;HUNTING LINDSAY;MAYERS BRIAN T.;MCLELLAN JOSEPH M.;REUST PATRICK;KUEGLER RALF;GILLIES JENNIFER |
| 分类号 |
H01L21/308;B29C59/16 |
主分类号 |
H01L21/308 |
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