| 摘要 |
<P>PROBLEM TO BE SOLVED: To make lateral displacement of a photomask small as far as possible, when the photomask is brought into contact with a substrate. <P>SOLUTION: A substrate 1 having a photosensitive layer formed on its surface is held on a substrate support base 17. A photomask 6 with a pattern drawn is held at a position covering the substrate 1. The substrate 1 is held at the substrate support base. While holding the photomask 6 at a position covering the substrate 1, a space 27 having an open surrounding is formed between the substrate 1 and the photomask 6. An air flow to guide the air within the space 27 to the outside is generated around the substrate 1 to produce a negative pressure in the space 27. By generating the negative pressure in the space 27, the photomask 6 is brought into contact with the substrate 11. <P>COPYRIGHT: (C)2007,JPO&INPIT |
