FLUORESCENCE PATTERN OF THE FLUORESCENT DYE INCORPORATED PHOTO-CROSSLINKABLE PHOTORESIET

摘要

PURPOSE: The fluorescence pattern of photo-crosslinkable photoresist mixed with fluorescent dye is provided to improve visibility and stability by blocking the influence of external environment. CONSTITUTION: Chemically amplified photoresist composition based on crosslinkable polymer, photo acid generator, fluorescent substance, and organic solvent is coated on a substrate. A patterned photo-mask is arranged on the coated substrate to be exposed. Fluorescent patterns(3) are formed based on a post baking operation. The post baking operation is implemented at a temperature between 90 and 120 degrees Celsius for 2 to 8 minutes. The photo acid generator is selected from triphenylsulfonium hexafluoroantimonite and triphenylsulfonium triflate.