Metal compounds for deposition of chalcogenide films at low temperature

摘要

Compounds of formula:
wherein M is selected from Ge, Te, and Sb and each R is independently selected from H, C1-C6 alkyl, C1-C6 alkylsilyl, C1-C6 perfluorocarbon, dialkylamino NR'R" (R', R" are independently selected from H, C1-C6 alkyl, C1-C6 alkylsilyl, C1-C6 perfluorocarbon), cyano, carbonyl, phenyl, benzyl, pyridyl, halogens such as F, Cl, Br, and I, sulfo, nitro, carboxy, hydroxyl, diazo, azido.