| 摘要 |
<p>PURPOSE: A heat treatment method and a heat treatment apparatus using the same are provided to restrict an acid diffusion length in a baking process after an exposure process using flash heating process time which is less than 1 second. CONSTITUTION: A chamber receives a substrate in which an exposure process is performed on a chemical amplified type resist film which is formed on the surface of the chamber. A cooling plate(81) places and maintains the substrate within the chamber. An exhaust unit ventilates the chamber. A humidified air supply unit(74) supplies humidified air to the chamber. A flash lamp(FL) projects flash light on the substrate which is placed on the cooling plate. A filter eliminates light which has a wavelength of 300nm or less from the flash light projected on the surface.</p> |
