发明名称 System and method for a charged particle beam
摘要 System and method for charged particle beam. According an embodiment, the present invention provides a charged particle beam apparatus. The apparatus includes a charged particle source for generating a primary charged particle beam. The apparatus also includes at least one condenser lens for pre-focusing the primary charge particle beam. Furthermore, the apparatus includes a compound objective lens for forming the magnetic field and the electrostatic field to focus the primary charged particle beam onto a specimen in the charged particle beam path. The specimen includes a specimen surface. The compound objective lens includes a conical magnetic lens, an immersion magnetic lens, and an electrostatic lens, the conical magnetic lens including an upper pole piece, a shared pole piece being electrically insulated from the upper pole piece, and an excitation coil.
申请公布号 US8164060(B2) 申请公布日期 2012.04.24
申请号 US20100832127 申请日期 2010.07.08
申请人 LIU XUEDONG;ZHANG XU;WANG JOE;TSENG EDWARD;CHEN ZHONGWEI;HERMES-MICROVISION, INC. 发明人 LIU XUEDONG;ZHANG XU;WANG JOE;TSENG EDWARD;CHEN ZHONGWEI
分类号 H01J37/244;H01J37/145 主分类号 H01J37/244
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