发明名称 CLEANING PROCESSING APPARATUS FOR BIOCOMPATIBLE IMPLANT
摘要 <P>PROBLEM TO BE SOLVED: To provide a cleaning processing apparatus for a biocompatible implant which is capable of quickly removing ozone generated by ultraviolet-ray radiation after completion of ultraviolet-ray radiation towards the biocompatible implant. <P>SOLUTION: The cleaning processing apparatus for a biocompatible implant performs cleaning processing of the biocompatible implant by means of radiating ultraviolet rays to the surface of the biocompatible implant and by causing ozone to contact the surface of the biocompatible implant, and the cleaning processing apparatus includes a housing, an ultraviolet-ray radiating lamp disposed within the housing and radiating ultraviolet rays to the biocompatible implant, an ozone-removing filter disposed within the housing, and a fan introducing ambient gas within the housing to the ozone-removing filter, and the fan is driven in response to the end of cleaning processing of the biocompatible implant. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012075549(A) 申请公布日期 2012.04.19
申请号 JP20100221828 申请日期 2010.09.30
申请人 USHIO INC 发明人 OGAWA YOSHIMASA
分类号 A61C19/00;A61C8/00;A61L2/10;A61L2/20 主分类号 A61C19/00
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