| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a formation method of a film pattern capable of forming a stripe-like pattern film even without using a stripe-like photo mask. <P>SOLUTION: The formation method includes: projecting a rectangular grid-like light-dark pattern 502 on a photosensitive layer 501; after that, displacing the light-dark pattern 502 in a direction of a side of the rectangle to project it on the photosensitive layer 501; and after that, developing the photosensitive layer 501. <P>COPYRIGHT: (C)2012,JPO&INPIT |
