发明名称 |
CHEMICAL MECHANICAL FABRICATION(CMF) FOR FORMING TILTED SURFACE FEATURES |
摘要 |
<p>A method of chemical-mechanical fabrication (CMF) for forming articles having tilted surface features. A substrate is provided having a patterned surface including two different layer compositions or a non-planar surface having at least one protruding or recessed feature, or both. The patterned surface are contacted with a polishing pad having a slurry composition, wherein a portion of surface being polished polishes at a faster polishing rate as compared to another portion to form at least one tilted surface feature. The tilted surface feature has at least one surface portion having a surface tilt angle from 3 to 85 degrees and a surface roughness<3 nm rms. The tilted surface feature includes a post-CMF high elevation portion and a post-CMF low elevation portion that defines a maximum height (h), wherein the tilted surface feature defines a minimum lateral dimension (r), and h/r is≧0.05.</p> |
申请公布号 |
KR20120037373(A) |
申请公布日期 |
2012.04.19 |
申请号 |
KR20117027034 |
申请日期 |
2010.04.13 |
申请人 |
SINMAT, INC.;UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. |
发明人 |
SINGH RAJIV K.;KUMAR PURUSHOTTAM;SINGH DEEPIKA;ARJUNAN ARUL CHAKKARAVARTHI |
分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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