| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which is stable to a solvent used in an immersion lithography process and has excellent sensitivity and a resist pattern profile. <P>SOLUTION: A positive resist composition comprises: a resin component (A) in which alkali solubility is increased by action of acid; an acid generator component (B) which generates the acid by exposure; an organic solvent (C) which dissolves the (A) component and the (B) component; and a nitrogen-containing organic compound (D). The resin component (A) has (a1) a constitutional unit derived from a (meth) acrylic acid ester having an acid-dissociable dissolution inhibiting group, (a2) a constitutional unit derived from the (meth) acrylic acid ester having a lactone unit, and (a4) a constitutional unit derived from the (meth) acrylic acid ester having a polycyclic group, but does not have (a0) (a0-1) a constitutional unit containing an anhydride of dicarboxylic acid and (a0-2) a constitutional unit containing a phenolic hydroxyl group. <P>COPYRIGHT: (C)2012,JPO&INPIT |
