发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of previously designating an operation upon occurrence of a trouble by allowing a practical form in a case of exceeding a threshold value to be selectable with regard to accumulated items such as accumulated film thickness values. <P>SOLUTION: The substrate processing apparatus includes at least a display section that displays an operation screen for performing at least parameter editing or the like; a storage section that stores instruction data inputted through the display section or the like, various kinds of recipes, and various kinds of parameters as a file; and an input section for inputting setting values of the various kinds of parameters when creating the various kinds of recipes. Further, the display section displays, for each predetermined component, the number of times or time that each component is executed, a threshold value corresponding to the number of times or the time, and a predetermined operation executed after reaching the threshold value. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012079922(A) 申请公布日期 2012.04.19
申请号 JP20100223711 申请日期 2010.10.01
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 YASHIMA TSUKASA
分类号 H01L21/02;G05B19/418;H01L21/31 主分类号 H01L21/02
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