发明名称 Anti-reflection plate and method for manufacturing anti-reflection structure thereof
摘要 A method for manufacturing an anti-reflection structure is provided. The method includes the following steps: First, a to-be-treated object is provided in a reactive area. Next, a plasma source is provided in the reactive area. Then, the plasma source is ionized to form plasma in atmospheric pressure. Next, the surface of the to-be-treated object is treated by plasma so as to form a plurality of micro-protuberances on the surface of the to-be-treated object.
申请公布号 US8158211(B2) 申请公布日期 2012.04.17
申请号 US20080343540 申请日期 2008.12.24
申请人 CHEN CHIH-WEI;WU CHIN-JYI;HSIEH WEN-TZONG;HSU WEN-TUNG;LIN CHUN-HUNG;INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 CHEN CHIH-WEI;WU CHIN-JYI;HSIEH WEN-TZONG;HSU WEN-TUNG;LIN CHUN-HUNG
分类号 H05H1/00;C23C4/00 主分类号 H05H1/00
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