发明名称 Heating center PCRAM structure and methods for making
摘要 Memory devices are described along with manufacturing methods. A memory device as described herein includes a bottom electrode and a first phase change layer comprising a first phase change material on the bottom electrode. A resistive heater comprising a heater material is on the first phase change material. A second phase change layer comprising a second phase change material is on the resistive heater, and a top electrode is on the second phase change layer. The heater material has a resistivity greater than the most highly resistive states of the first and second phase change materials.
申请公布号 US8158965(B2) 申请公布日期 2012.04.17
申请号 US20080026342 申请日期 2008.02.05
申请人 CHEN SHIH-HUNG;MACRONIX INTERNATIONAL CO., LTD. 发明人 CHEN SHIH-HUNG
分类号 H01L47/00 主分类号 H01L47/00
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