| 摘要 |
An apparatus for cleaning a sawn wafer block (40) has a cleaning basin (10), a holder (50, 52) for holding a sawn wafer block (40) in the cleaning basin (10) in such a way that, when there is a cleaning fluid (34) in the cleaning basin (10), at least one portion of the wafer block (40) that has sawn gaps is arranged in the cleaning fluid, at least one outlet opening (18) in a bottom region (16) of the cleaning basin (10) and a closure device (20, 22) for the outlet opening (18), by which the outlet opening (18) can be opened and closed. The closure device (20, 22), the outlet opening (18) and the bottom region of the cleaning basin are designed in such a way that, by opening the closure device (20, 22), the cleaning fluid can be emptied so quickly from at least the region of the cleaning basin (10) in which the wafer block is arranged that contaminants can be removed from the sawn gaps by the suction effect of the cleaning fluid.
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