发明名称 |
Resist protective coating composition and patterning process |
摘要 |
A protective coating composition comprising a copolymer of an alkali-soluble (α-trifluoromethyl) acrylate and a norbornene derivative as a base polymer, optionally in admixture with a second polymer containing sulfonic acid and/or sulfonic acid amine salt in repeat units is applied onto a resist film. The protective coating is effective in minimizing development defects and forming a resist pattern of improved profile.
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申请公布号 |
US8158330(B2) |
申请公布日期 |
2012.04.17 |
申请号 |
US20090463750 |
申请日期 |
2009.05.11 |
申请人 |
HARADA YUJI;HATAKEYAMA JUN;HASEGAWA KOJI;SHINACHI SATOSHI;SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HARADA YUJI;HATAKEYAMA JUN;HASEGAWA KOJI;SHINACHI SATOSHI |
分类号 |
G03F7/004;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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