发明名称 |
Calibration and verification structures for use in optical proximity correction |
摘要 |
A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one of the two portions; and mirror-imaging the other of the two portions about the axis of symmetry. The design may be centered. |
申请公布号 |
US8161421(B2) |
申请公布日期 |
2012.04.17 |
申请号 |
US20080168383 |
申请日期 |
2008.07.07 |
申请人 |
VISWANATHAN RAMYA;ABDO AMR Y.;HAFFNER HENNING;PARK OSEO;SCAMAN MICHAEL E.;INTERNATIONAL BUSINESS MACHINES CORPORATION;INFINEON TECHNOLOGIES AG |
发明人 |
VISWANATHAN RAMYA;ABDO AMR Y.;HAFFNER HENNING;PARK OSEO;SCAMAN MICHAEL E. |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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