| 摘要 |
There is disclosed an exposure method is a method of projecting patterns (M1, M2) of a mask (M) onto a substrate to effect exposure thereof, through a plurality of projection optical units each having an enlargement magnification, and the exposure method comprises: placing the mask (M) having first pattern regions (M1) arranged discontinuously in a positional relation corresponding to the enlargement magnification, and second pattern regions (M2) provided at least in part between the first pattern regions (M1), on the object plane side of the projection optical units; projecting enlarged images of either of the first pattern regions (M1) and the second pattern regions (M2) onto the substrate disposed on the image plane side of the projection optical units to effect exposure thereof; and then projecting enlarged images of the other pattern regions onto the substrate to effect exposure thereof. |
