发明名称 |
Cleaning solvent and cleaning method for metallic compound |
摘要 |
Disclosed are cleaning solvents and cleaning methods for metallic compounds deposited on the equipment that supplies organometallic compounds to the manufacturing tool in the photovoltaic industry or the semiconductor industry. The cleaning solvents and the cleaning methods disclosed not only selectively remove the metallic compound without corroding the equipment, but also improve the ordinary cleaning process. Moreover, the cleaning solvents and the cleaning methods disclosed improve maintenance costs for the supply system because the equipment may be cleaned without being detached from the supply system. |
申请公布号 |
US8158569(B2) |
申请公布日期 |
2012.04.17 |
申请号 |
US201113279459 |
申请日期 |
2011.10.24 |
申请人 |
SAKATA YOICHI;L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE |
发明人 |
SAKATA YOICHI |
分类号 |
C11D3/20;C11D3/30;C11D3/44 |
主分类号 |
C11D3/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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