REAL TIME NITRIDING DEPTH MONITORING METHOD AND APPARATUS FOR PLASMA NITRIDING PROCESS

摘要

PURPOSE: A real time nitriding depth monitoring method and apparatus for plasma nitriding process are provided to predict thermal transformation by over-nitriding and to control surface hardness. CONSTITUTION: A real time nitriding depth monitoring method is as follows. The nitriding activation energy of specimen is inputted to a controller. A desired nitriding depth of specimen is inputted to the controller. The accumulated energy value is calculated by using nitrate activation energy of the furnace and the internal temperature condition of a furnace. A modeling experiment is performed to calculate experimental values according to cumulative energy numerical variables. The nitrided depth is calculated by the regression equation according to the change of the cumulative energy variables. It is monitored through the controller. The cooling of specimen is determined by a monitored nitrided depth.